2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...
LONDON — ASML Holding NV has converted a Twinscan AT:1150 193-nm wavelength lithography system to accommodate a water bath and allow immersion lithography, the company said at a financial analysts' ...
Process miniaturization is the current trend in lithography for manufacturing semiconductor devices. The development of next-generation dynamic random access memory requires the 32-nm half-pitch node ...
Hanyang University has presented a paper that describes a novel molybdenum disilicide (MoSi2) pellicle membrane for use in extreme ultraviolet (EUV) lithography. With a 28nm thickness, a MoSi2 ...
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