Canon Inc. announced that it shipped its most advanced lithography platform, the FPA-1200NZ2C nanoimprint lithography (NIL) system for semiconductor manufacturing to the Texas Institute for ...
YOKOHAMA—After a decade of development, Canon Inc. began selling lithography equipment for semiconductor production, hoping ...
Nanoimprint is an emerging lithographic technology that promises high-throughput patterning of nanostructures. Based on the mechanical embossing principle, nanoimprint technique can achieve pattern ...
MELVILLE, N.Y.--(BUSINESS WIRE)--Canon U.S.A. Inc., a leader in digital imaging solutions, today announced that its parent company, Canon Inc., is developing a next-generation semiconductor ...
Using a combination of experimental data and simulations, researchers have identified key parameters that predict the outcome of nanoimprint lithography, a fabrication technique that offers an ...
Step-and-repeat nanoimprint lithography (NIL) is a promising technique to replicate nanoscale patterns at low cost across a large area. Last year, researchers Christophe Peroz and Scott Dhuey and ...
Several lithographic techniques are used for patterning in the nanoscale region. This article examines nanoimprint lithography (NIL), an emerging process that can produce sub-10nm features Nanoimprint ...
Photonic-based devices such as light-emitting diodes (LEDs), lasers and photovoltaics Micro arrays and nano-devices for medical devices and bioengineered applications Advanced storage media, including ...
Nanoimprint lithography (NIL) is a promising technique for fine-patterning with a lower cost than other lithography techniques such as EUV or immersion with multi-patterning. NIL has the potential of ...
Invented 20 years ago, nanoimprint lithography offers a powerful manufacturing alternative for the semiconductor and other nanotechnology sectors, says Helmut Schift Pressing matter A technician from ...
Nano imprinting with Bulk Metallic Glass enables to directly replicate smallest features with high aspect ratio. Our current record is 13 nm and 50 for feature diamater and aspect ratio, respectively.
NIL involves spin-coating a polymer resist on a substrate and pressing a mold/stamp over it, causing the resist to fill the mold. The resin is then cured, and the mold is separated from the substrate ...
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