Several lithographic techniques are used for patterning in the nanoscale region. This article examines nanoimprint lithography (NIL), an emerging process that can produce sub-10nm features Nanoimprint ...

Different methods capable of developing complex structures and building elements with high-aspect-ratio nanostructures combined with microstructures, which are of interest in nanophotonics, are ...

Nanoimprint lithography, which for decades has trailed behind traditional optical lithography, is emerging as the technology of choice for the rapidly growing photonics and biotech chips markets.

Step-and-repeat nanoimprint lithography (NIL) is a promising technique to replicate nanoscale patterns at low cost across a large area. Last year, researchers Christophe Peroz and Scott Dhuey and ...

Using a combination of experimental data and simulations, researchers have identified key parameters that predict the outcome of nanoimprint lithography, a fabrication technique that offers an ...

Dip Pen Nanolithography (DPN), a direct-write soft lithography method, is used to develop nanostructures on a preferred substrate by offering sets of molecules through capillary transport from an ...

Founded on research at the University of Massachusetts Amherst, USA, the company operates from Amherst, MA. Myrias has raised $7.5 million in total funding, including $6.0 million in dilutive capital ...

Photonic-based devices such as light-emitting diodes (LEDs), lasers and photovoltaics Micro arrays and nano-devices for medical devices and bioengineered applications Advanced storage media, including ...

When will the protruding rear camera on smartphones become obsolete? The implementation of a metasurface, which completely disregards the properties of light, promises to reduce the thickness of a ...

Nanoimprint has been discussed, debated, and hyped since the term was first introduced in 1996. Now, a full 20 years later, it is being taken much more seriously in light of increasing photomask costs ...

Recently, the Japanese semiconductor equipment manufacturer Canon released the nanoimprint lithography (NIL) machine FPA-1200NZ2C, capable of achieving a 5-nanometer process node. Nanoimprint ...