ACM Research, a two-year-old Californian company, says it can see the end of the road for chemical mechanical polishing (CMP), and is looking to move in on the market with a non-contact process. It ...
CHANDLER, Ariz., Sept. 24, 2024 (GLOBE NEWSWIRE) -- Axus Technology, a leading global provider of chemical mechanical planarization (CMP) equipment, critical for semiconductor and compound ...
To allow real-time control of dielectric chemical mechanical planarization (CMP) processes to the 45 nm device node and beyond, Santa Clara, Calif.-based semiconductor manufacturing equipment leader ...
SAN LUIS OBISPO, Calif., July 6, 2023 /PRNewswire/ -- Revasum today announced the availability of 200mm SiC wafer polishing capability on their 6EZ chemical mechanical polishing platform. The 6EZ has ...
Chemical Mechanical Planarization (CMP) is a critical process in the semiconductor, LED wafer, and hard disk manufacturing industry and is used to achieve the substrate wafer's required planarity.
Newark, Dec. 08, 2022 (GLOBE NEWSWIRE) -- As per the report published by The Brainy Insights, the global Chemical Mechanical Planarization (CMP) slurry market is expected to grow from USD 1.5 billion ...
SANTA CLARA, USA: Applied Materials Inc. announced its new Applied FullVision System that enables real-time control of dielectric CMP1 processes to the 45nm device node and beyond. The FullVision ...
Chemical mechanical polishing (CMP) – also known as planarization – has long been the most commonly employed technique for smoothing and flattening wafer surfaces during the fabrication of ...
Grenoble, France. Leti, a research institute at CEA Tech, and CMP, a service organization that provides prototyping and low-volume production of ICs and MEMS, today announced the industry’s first ...
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