ASML has just officially shipped its very first High-NA EUV lithography scanner to Intel, with the sparkling new Twinscan EXE:5000 extreme ultraviolet (EUV) scanner being the first High-NA scanner ...

SANTA CLARA, Calif. —Intel Corp. said Monday (April 22) that it has ordered a beta-stage extreme ultraviolet lithography scanner from ASM Lithography (Veldhoven, Netherlands) to help it prepare for ...

ASML has delivered a first-generation Twinscan EXE:5000 High-NA extreme ultraviolet (EUV) lithography scanner to Intel, seven years after Intel first ordered the machine. The High numerical aperture ...

2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...

SANTA CLARA, Calif., Feb. 28, 2023 (GLOBE NEWSWIRE) -- Applied Materials, Inc. today introduced a new eBeam metrology system specifically designed to precisely measure the critical dimensions of ...

TOKYO--(BUSINESS WIRE)--Nikon Corporation introduces the NSR-S631E ArF immersion scanner, ensuring world-class device patterning and optimum fab productivity to fully satisfy real-world 7 nm node ...

Hanyang University has presented a paper that describes a novel molybdenum disilicide (MoSi2) pellicle membrane for use in extreme ultraviolet (EUV) lithography. With a 28nm thickness, a MoSi2 ...

Process miniaturization is the current trend in lithography for manufacturing semiconductor devices. The development of next-generation dynamic random access memory requires the 32-nm half-pitch node ...

OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton Inc., a major lithography light source manufacturer, announced today that it has completed delivery of its first ArF immersion Excimer laser supporting 450-mm ...

At this week’s 2020 EUVL Workshop, KJ Innovation will present more details about its efforts to develop a maskless extreme ultraviolet (EUV) lithography technology. Still in R&D, KJ Innovation’s ...